Principle and Typical Application of Laser Etching Technology

The basic principle of laser etching is to focus a low-power laser with high beam quality (generally ultraviolet laser, fiber laser) on a very small spot, form a high power density at the focus, and evaporate the material instantly to form holes, grooves, slots, resulting in extremely small power densities. Laser micro-nano cutting, cutting, etching, drilling and other processes.

Technical characteristics of laser etching technology

Laser non-contact processing, high flexibility, high speed, no noise, small heat-affected zone, small spot that can be focused to the laser wavelength level, etc., especially in terms of drilling, scribing, etching, cutting dimensional accuracy and processing quality It is the "cold processing" of "photochemical action" that interacts with certain materials (such as polyimide), and the "cold processing" that can obtain no carbonization effect, especially the interaction with certain materials (such as polyimide) belongs to "Cold processing" of "photochemical action" can obtain "cold processing" without carbonization effect, especially the "cold processing" of "photochemical action" that can obtain non-carbonization effect when interacting with certain materials (such as polyimide) "Cold processing", especially "cold processing" that is "photochemical" when interacting with certain materials (such as polyimide), can obtain "cold processing" without carbonization effect, especially with certain materials (such as polyimide) amine) interaction as "photochemical interaction"

Typical application of laser etching technology.

1) Thin film laser etching application.

benefit:

Good reproducibility, high power, fast material removal speed, no chemical corrosion pollution. ITO coating laser etching machine is a precision equipment that uses laser to etch ITO coating on the surface of ITOGlass and ITOFilm. It can perform high-precision and high-speed etching of various sizes on glass, PET, ITO coating, polycrystalline film and other oxide films, and can process electrodes of various specifications. It is especially suitable for electrode etching technology of mobile phone touch screen.

Glass laser etching technology, ITO.

2) Laser scribing of solar cells.

benefit:

The overall structure is reasonable, the cutting speed is fast, the precision is high, the function is complete, the performance index is stable and reliable, the failure rate is low, the non-contact processing yield is high, and the application range is wide.

Simple and easy to operate, 24 hours of continuous work, energy saving and environmental protection.

Using the graphical user interface (GUI), the man-machine interface is friendly, and the cutting track can be displayed in real time, and the operation is simple and intuitive.

Optional automatic image recognition processing and positioning functions.

A solar cell is a device that converts energy directly into electricity by using the photoelectric or photochemical effect. Thin film solar cell production process: substrate (TCO conductive glass) - glass edging - glass cleaning - 1064 laser scoring - secondary cleaning - fixture heating and preheating - PECVD deposition of amorphous silicon film - cooling fixture - 635 laser scoring - PVD Magnetron Sputtering - 635 Laser Scribing - Testing - Aging - Laser Cleaning - Triple Cleaning - Welding Polar Lines - Lamination - Mounting Frames. It is used for laser scribing of thin-film solar cells, with small heat-affected area and good scribing quality. The non-contact processing method avoids the stress generated in the blade processing, which can effectively improve the high-quality product rate of silicon wafer modification, and also greatly improve the quality of cell scribing. Optional configuration of CCD image processing system to achieve precise scribing of cells with special specifications.

Photoelectric solar cell laser etching technology.

3) Laser grinding.

benefit:

Green and environmental protection, without any chemicals and cleaning agents.

No contact cleaning, no mechanical force, no deformation, high efficiency and time saving.

It can achieve cleaning effect that cannot be achieved by conventional cleaning.

Contaminants on the surface of the material can also be selectively cleaned without damaging the surface of the material.

The laser has the characteristics of fast and pollution-free. Through the special control software, the interface is friendly, and various laser tasks can be completed at the same time. It is suitable for insulation, removal and cleaning of coatings around amorphous silicon thin film solar panels.